JOB POST: Project Assistants (Chemistry) at CSIR- Electrochemical Research Institute, Tamil Nadu: Apply by Oct 21: Expired


Walk-in-Interview will be held at CSIR-Central Electrochemical Research Institute, Karaikudi on 21.10.2019 (Monday) at 9.00 AM for the selection of suitable candidates for the temporary positions to be engaged in various projects.

  • Project Assistant-I
  • Project Assistant-II
  • Project Assistant-III
Project Title
  1. HF and HCI mixed acid recovery from silicon carbide purification process effluent via diffusion dialysis and bipolar membrane electrodialysis.
  2. Development of Visible Light Active Functional Materials for Efficient Photocatalytic and Photoelectrocataltic Generation of Hydrogen.
  3. Catalysis for Sustainable development.
  4. Development and construction of lightweight AL-Si-Mg aerospace/automotive components using additive manufacturing and powder metallurgy processes.
  • M.Sc. in Chemistry with 55% marks (50% marks for SC/ST) OR,
  • B.Tech. in Chemical Engineering with 55% marks (50% marks for SC/ST) OR,
  • M.Tech. in Mechanical Engineering with 55% marks.
  1. Project Assistant-I: Rs. 25,000/-pm
  2. Project Assistant-II: Rs. 25,000/-pm
  3. Project Assistant-III: Rs. 28,000/- pm
  1. The engagement is purely on temporary basis, initially for a period of six months which may be extended or curtailed depending on the tenure of the project/satisfactory performance or conduct of the appointee as the case may be and does not confer any right/claim implicit or explicit on any candidate for claiming extension or absorption in CSIR-CECRI.
  2. Eligible candidates may appear for Walk-in-Interview with all original and one set of photocopies of certificates of educational qualification, age, caste (in case of SC/ST/OBC candidates), experience (if any), one recent passport size photo and duly filled-in application at 09:00 AM on 21.10.2019 (Monday) CSIR-CECRI, Karaikudi.

Phone Number: 04565-241241 / 227778

For further details, click here.

Subscribe to our newsletter

Leave a Reply

Your email address will not be published. Required fields are marked *